Committee

DPS 2015 » Committee

Committee Chairpersons

  • Organizing Committee Chair: Tetsuya Tatsumi (Sony Corp.)
  • Executive Committee Chair: Satoshi Hamaguchi (Osaka University)
  • Program Committee Chair: Tomohiro Okumura (Panasonic Corp.)
  • Publication Committee Chair: Takanori Ichiki (The University of Tokyo)

Organizing Committee

Chair:  T. Tatsumi (Sony Corp.) Japan
Vice-chair:  N. Fujiwara (Mitsubishi Electric Corp.) Japan
S. Hamaguchi (Osaka University) Japan
H. Hayashi (Toshiba Corp.) Japan
M. Honda (TOKYO ELECTRON MIYAGI LTD.) Japan
M. Hori (Nagoya University) Japan
T. Ichiki (The University of Tokyo) Japan
K. Ishikawa (Nagoya University ) Japan
M. Izawa (Hitachi High-Technologies Corp.) Japan
N. Itabashi (Hitachi, Ltd.) Japan
K. Kinoshita (PETRA) Japan
H. Kokura (Samsung Electronics Co., Ltd) Korea
T. Koshizawa (Applied Materials Inc.) USA
K. Nojiri (Lam Research Corp.) Japan
T. Ohiwa (TOKYO ELECTRON LIMITED) Japan
T. Okumura (Panasonic Corp.) Japan
K. Ono (Kyoto University) Japan
K. Sasaki (Hokkaido University) Japan
M. Sekine (Nagoya University) Japan

International Organizing Committee

A. Agarwal (Applied Materials) USA
T-H. Ahn (Samsung Electronics Co., Ltd.) Korea
W. Boullart (Interuniversity Microelectronics Center-IMEC) Belgium
J. Brcka (Tokyo Electron U.S. Holdings, Inc.) USA
H.Y. Chang (Korea Advanced Institute of Science and Technology) Korea
E-H. Choi (Kwangwoon University) Korea
V. Donnelly (University of Houston) USA
O. Joubert (LTM/CNRS) France
C. Labelle (GLOBALFOUNDRIES) USA
K. C. Leou (National Tsing Hua University) Taiwan
T. Lill (Lam Research Corp.) USA
G. S. Oehrlein (University of Maryland) USA
L. Overzet (University of Texas at Dallas) USA
R. van de Sanden (DIFFER) Netherlands
J.S. Wu (National Chiao Tung University) Taiwan
G-Y. Yeom (Sungkyunkwan University) Korea
S-J. Yoo (NFRI) Korea

Executive Committee

Chair: S. Hamaguchi (Osaka University) Japan
Vice-chair: T. Nakano (National Defense Academy of Japan) Japan
Vice-chair: K. Sasaki (Hokkaido University) Japan
K. Eriguchi (Kyoto University) Japan
H. Kakiuchi (Osaka University) Japan
K. Karahashi (Osaka University) Japan
O. Sakai (University of Shiga Prefecture) Japan
K. Takahashi (Kyoto Institute of Technology) Japan
S. Yoshimura (Osaka University) Japan

Publication Committee

Chair:  T. Ichiki (The University of Tokyo) Japan
Vice-chair:  K. Ishikawa (Nagoya University) Japan
Vice-chair:  M. Sekine (Nagoya University) Japan
K. Eriguchi (Kyoto University) Japan
S. Higashi (Hiroshima University) Japan
S. Hotta (Kyoto Institute of Technology) Japan
N. Itabashi (Hitachi, Ltd.) Japan
K. Kinoshita (PETRA) Japan
N. Kuboi (Sony Corp.) Japan
H. Kuwano (Tohoku University) Japan
S. Nunomura (Advanced Industrial Science and Technology-AIST) Japan
L. Overzet (University of Texas at Dallas) USA
O. Sakai (University of Shiga Prefecture ) Japan
K. Sasaki (Hokkaido University) Japan
Y. Shimogaki (The University of Tokyo) Japan
M. Shiratani (Kyushu University) Japan
E. Stamate (Technical University of Denmark) Denmark
K. Takahashi (Kyoto Institute of Technology) Japan

Program Committee

Chair:  T. Okumura (Panasonic Corp.) Japan
Vice-chair:  H. Hayashi (Toshiba Corp.) Japan
Vice-chair:  M. Honda (TOKYO ELECTRON MIYAGI LTD.) Japan
K. Azuma (Shimadzu Corp.) Japan
J-P. Booth (CNRS/Ecole Polytechnique) France
K-N. Chen (National Chiao Tung University) Taiwan
A. Dzarasova (Quantemol Ltd.) UK
D.J. Economou (University of Houston) USA
E. Eriguchi (Kyoto University) Japan
M. Fukasawa (Sony Corp.) Japan
T. Hayashi (Nagoya University) Japan
N. Hayashi (Kyushu University) Japan
S. Higashi (Hiroshima University) Japan
M. Hiramatsu (Meijo University) Japan
S. Hotta (Kyoto Institute of Technology) Japan
T. Ichiki (The University of Tokyo) Japan
K. Ishikawa (Nagoya University) Japan
N. Itabashi (Hitachi, Ltd.) Japan
S. Y. Kang (Tokyo Electron Ltd.) Japan
K. Karahashi (Osaka University) Japan
H. Kobayashi (Hitachi, Ltd.) Japan
K. Koga (Kyushu University) Japan
H. Kokura (Samsung Electronics Co., Ltd.) Korea
H. Kondo (Nagoya University) Japan
A. Koshiishi (Tokyo Electron Ltd.) Japan
T. Koshizawa (Applied Materials Inc.) Japan
S. Kumagai (Toyota Technological Institute) Japan
K. Kurihara (Toshiba Corp.) Belgium
H. Kuwano (Tohoku University) Japan
J-F. de Marneffe (Interuniversity Microelectronics Center-IMEC) Belgium
T. Maruyama (Renesas Electronics Corp.) Japan
M. Matsui (Hitachi, Ltd.) Japan
S. Miyazaki (Nagoya University) Japan
Y. Morikawa (ULVAC Inc.) Japan
M. Morimoto (Hitachi High-Technologies Corp. Taiwan) Taiwan
K. Nakamura (Chubu University) Japan
M. Nakamura (MAMO) Japan
Y. Nakao (FUJITSU Semiconductor Ltd.) Japan
M. Nakatani (Panasonic Corp.) Japan
N. Negishi (Hitachi High Technologies America, Inc.) USA
K. Nojiri (Lam Research Corp.) Japan
S. Nunomura (Advanced Industrial Science and Technology -AIST) Japan
H. Ohtake (Tokyo Electron Ltd.) USA
F. Roozeboom (Eindhoven University of Technology-TU/e) Netherlands
O. Sakai (University of Shiga Prefecture) Japan
Y. Sakiyama (Lam Research Corp.) USA
K. Sasaki (Hokkaido University) Japan
M. Sekine (Nagoya University) Japan
Y. Setsuhara (Osaka University) Japan
D. Shamiryan (Mapper) Russia
T. Shimizu (terraplasma GmbH) Germany
Y. Shimogaki (The University of Tokyo) Japan
K. Shin (Samsung Electronics Co., Ltd.) Korea
T. Shirafuji (Osaka City University) Japan
M. Shiratani (Kyushu University) Japan
E. Stamate (Technical University of Denmark) Denmark
S. Tajima (Nagoya University) Japan
K. Takahashi (Kyoto Institute of Technology) Japan
H. Toyoda (Nagoya University) Japan
T. Watanabe (Waseda University) Japan
T. Yagisawa (Toshiba Corp.) Japan
H. Yamauchi (Sharp Corp.) Japan
G-Y. Yeom (Sungkyunkwan University) Korea

International Advisory Committee

Chair:  J. Nishizawa (Tohoku University) Japan
C-K. Choi (Jeju National University) Korea
S. Fujimura (Tokyo Institute of Technology) Japan
R. A. Gottscho (Lam Research Corp.) USA
J-G. Han (Sungkyunkwan University) Korea
Y. Horiike (Tsukuba University) Japan
K. Horioka (Applied Materials Inc.) Japan
M. Kondo (AIST RCPVT) Japan
T. Makabe (Keio University) Japan
S. Tachi (Hitachi High-Technologies Corp.) Japan
K. Tachibana (Osaka Electro-Communication University) Japan
O. Takai (Kanto Gakuin University) Japan
K. Tsujimoto (JST) Japan
M. Yoneda ( ULVAC Inc.) Japan
S. Zaima (Nagoya University) Japan