DPS 2020 42nd International Symposium on Dry Process

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Postponed to 2021

Due to serious concerns related to the COVID-19 outbreak, DPS Organizing Committee made the difficult decision to postpone the 42nd International Symposium on Dry Process (DPS2020), originally scheduled for November 19-20 in Tokyo, Japan.
The dates for the rescheduled the 42nd International Symposium on Dry Process (DPS2021) is November 18 and 19, 2021.

Scope

The 42nd International Symposium on Dry Process (DPS2020) (DPS2021) will be held at Masaru Ibuka Auditorium, Waseda University, Tokyo, Japan, from November 19 to 20, 2020 November 18 and 19, 2021. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than four decades.

Important dates

Abstract Submission Deadline: July 17, 2020
Early Registration Deadline: October 9, 2020
Late Registration Deadline (Online): October 31, 2020

Recent Updates

Jun. 24, 2020
Rescheduled to November 18 and 19, 2021.
Jun. 2, 2020
Postponed to 2021.
Feb. 3, 2020
DPS2020 website open.

News for the Special Issues of Japanese Journal of Applied Physics (JJAP).

IF for the special issue of DPS in JJAP

1.67 (2017)

OPEN ACCESS & FREE ACCESS

Regular Papers

DPS paper award that is given to excellent papers in the recent special issues of "Dry Process" and the articles are set "Open Access" for ever, or "Free Access" until December 2025.

DPS2019 DPS Paper Award: "A method for high selective etch of Si3N4 and SiC with ion modification and chemical removal"
Sho Kumakura, Masahiro Tabata and Masanobu Honda
JJAP, 58(2019), SEEB01

DPS2018 DPS Paper Award: "Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate",
Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, Masaru Kurihara, Tomoyuki Watanabe, Yutaka Kouzuma, Kenetsu Yokogawa, Satoshi Sakai, Masaru Izawa
JJAP, 56(2017), 06HB01

DPS2017 DPS Paper Award: "Highly selective etching of LaAlSiOx to Si using C4F8/Ar/H2 plasma",
Sasaki, Toshiyuki; Matsuda, Kazuhisa; Omura, Mitsuhiro; Sakai, Itsuko; Hayashi, Hisataka
JJAP, 54(2015), 06GB03

DPS2016 DPS Paper Award: "Plasma process induced physical damages on multilayered magnetic films for magnetic domain wall motion",
Kinoshita, Keizo; Honjo, Hiroaki; Fukami, Shunsuke; et al.
JAPP, 53(2014), 03DF03

DPS2015 DPS Paper Award: "Effects of straggling of incident ions on plasma-induced damage creation in "fin"-type field-effect transistors",
Eriguchi, Koji; Matsuda, Asahiko; Takao, Yoshinori; et al.
JJAP, 53(2014), 03DE02


Progress Reviews

"Rethinking surface reactions in nanoscale dry processes towardatomic precision and beyond: a physics and chemistry perspective"
Kenji Ishikawa, Tatsuo Ishijima, Tatsuru Shirafuji, Silvia Armini, Emilie Despiau-Pujo, Richard A. Gottscho, Keren J. Kanarik, Gert J. Leusink, Nathan Marchack, Takahide Murayama, Yasuhiro Morikawa, Gottlieb S. Oehrlein, Sangwuk Park, Hisataka Hayashi and Keizo Kinoshita
JJAP.58(2019), SE0801

"Progress and perspectives in dry processes for nanoscale featurefabrication: fine pattern transfer and high-aspect-ratio featureformation"
Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima and Kenji Ishikawa
JJAP.58(2019), SE0802

"Progress and perspectives in dry processes for emergingmultidisciplinary applications: how can we improve our use of dry processes?"
Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima and Kenji Ishikawa
JJAP.58(2019), SE0803

"Progress and perspectives in dry processes for leading-edgemanufacturing of devices: toward intelligent processes and virtualproduct development"
Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima and Kenji Ishikawa
JJAP.58(2019), SE0804

"Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?”,
Kenji Ishikawa, Kazuhiro Karahashi, Tatsuo Ishijima, Sung Il Cho, Simon Elliott, Dennis Hausmann, Dan Mocuta, Aaron Wilson and Keizo Kinoshita
JJAP.57(2018).06JA01


News for Japanese members

応用物理学会プラズマエレクトロニクス分科会の主催により、「第31回プラズマエレクトロニクス講習会」を 2020 年11 月20 日(金)にWebexによるネット開催を致します。 本講習会では、産業応用で必要とされるプロセスプラズマの生成、診断・制御の基礎と、その先端応用技術を各分野にて第一線でご活躍の先生方よりご講義いただきます。詳しくはこちらをご参照ください。