Theme/Topics/Arranged session

DPS 2017 » Theme/Topics/Arranged session


  • Dry processes and related technologies from fundamentals to applications


  1. Etching Technologies
  2. Manufacturing Technologies (AEC, APC, EES, FDC)
  3. Surface Reaction and Damage
  4. Plasma Diagnostics and Monitoring Systems
  5. Modeling and Simulation
  6. Plasma Generation (Equipment/Source)
  7. Deposition Technologies (CVD / PVD)
  8. Atomic Layer Processes (ALD/ALE)
  9. Plasma Processes for 3D Device, FPD, Photovoltaic Devices
  10. Plasma Processes for New Material Devices (MRAM, Power, Organic)
  11. Plasma Processes for Biological and Medical application, MEMS
  12. Atmospheric Pressure Plasma and Liquid Plasma
  13. New Dry Process Concepts

Arranged session

A1.  Surface reactions for atomic layer controlled processes (ALE/ALD)
A2.  Etching technologies for latest devices having high-aspect-ratio of 50 or more (HAR)