DPS2017 - 39th International Symposium on Dry Process

Recipients of DPS2017 Nishizawa Award:

David Barry Graves Professor, University of California,Berkeley
Toshiaki Makabe Professor Emeritus, Keio University
Masahiro Yoneda Fellow, ULVAC, Inc.

Scope

The 39th International Symposium on Dry Process (DPS2017) will be held at Tokyo Tech Front (Kuramae Kaikan), Ookayama Campus, Tokyo Institute of Technology, Tokyo in Japan on November 16 & 17, 2017. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

Important dates

Recent Updates

• Nov. 16, 2017 Submission deadline to JJAP extended to November 23, 2017.
• Nov. 2, 2017 On-line registration is closed. On-site registration is available for those who would like to attend the DPS2017.
• Oct. 26, 2017 Presentation Guidelines and Poster Program opened.
• Oct. 24, 2017 Timetable updated.
• Oct. 03, 2017 JJAP special issue On-Line Submission is opened.
• Sep. 14, 2017 Timetable(Tentative) updated.
• Aug. 28, 2017 Notification of abstract acceptance will be announced by the middle of September, 2017.
• Jul. 07, 2017 Submission deadline extended to July 24, 2017.
• Jun. 19, 2017 On-Line Registration opened.
• Jun. 06 2017 Updeted (News for the Special Issues of Japanese Journal of Applied Physics (JJAP))
• Jun. 05 2017 Special Issue of JJAP is published.
• May 12, 2017 Timetable(Tentative) is available.
• May 11, 2017 Invited Speakers and tentative titles opened.
• May 11, 2017 On-Line Submission system is opened.
• Feb. 21, 2017  DPS2017 website open.

News for the Special Issues of Japanese Journal of Applied Physics (JJAP).

DPS Paper Award Winners

DPS paper award that is given to excellent papers in the recent special issues of “Dry Process”, and the article is set “Open Access” for ever.

DPS2017 DPS Paper Award:

• "Highly selective etching of LaAlSiO_x to Si using C₄F₈/Ar/H₂ plasma",
  Sasaki, Toshiyuki; Matsuda, Kazuhisa; Omura, Mitsuhiro; Sakai, Itsuko; Hayashi, Hisataka
  JJAP, 54(2015), 06GB03
  http://iopscience.iop.org/article/10.7567/JJAP.54.06GB03

DPS2016 DPS Paper Award:

• "Plasma process induced physical damages on multilayered magnetic films for magnetic domain wall motion",
  Kinoshita, Keizo; Honjo, Hiroaki; Fukami, Shunsuke; et al.
  JAPP, 53(2014), 03DF03
  http://iopscience.iop.org/article/10.7567/JJAP.53.03DF03

DPS2015 DPS Paper Award:

• "Effects of straggling of incident ions on plasma-induced damage creation in "fin"-type field-effect transistors",
  Eriguchi, Koji; Matsuda, Asahiko; Takao, Yoshinori; et al.
  JJAP, 53(2014), 03DE02
  http://iopscience.iop.org/article/10.7567/JJAP.53.03DE02

• The deadline for submission to the Special Issue is November 16 23, 2017.
• The publication charge is 20000JPY/article.
  https://journals.jsap.jp/jjap/special-issues/information
• JJAP Special Issues is published in the web site;
  DPS2016 (Jpn. J. Appl. Phys. 56 June 2017.)(Free until June 2018)
  http://iopscience.iop.org/issue/1347-4065/56/6S2
  DPS2015（Jpn. J. Appl. Phys. 55(6S2) June 2016）
  http://iopscience.iop.org/issue/1347-4065/55/6S2
  DPS2014（Jpn. J. Appl. Phys. 54(6S2) June 2015）
  http://iopscience.iop.org/1347-4065/54/6S2
  DPS2013（Jpn. J. Appl. Phys. 53 (3S2) March 2014）
  http://iopscience.iop.org/1347-4065/53/3S2

News for Japanese members

応用物理学会プラズマエレクトロニクス分科会の協賛により、「第28回プラズマエレクトロニクス講習会」を 2017 年11 月15 日(水)に東京大学 本郷（浅野）キャンパス 武田先端知ビル 「武田ホール」にて開催致します。
同講習会では、産業応用で必要とされる産業応用で必要とされるプロセスプラズマの生成、診断、制御の基礎と、その先端応用技術について、各分野にて第一線でご活躍の先生方より御講義頂く予定です。詳しくはこちら をご参照ください。