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The 39th International Symposium on Dry Process (DPS2017) will be held at Tokyo Tech Front (Kuramae Kaikan), Ookayama Campus, Tokyo Institute of Technology, Tokyo in Japan on November 16 & 17, 2017. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

Important dates

   Abstract Submission Deadline: July 14, 2017
   Early Registration Deadline: October 6, 2017
   Late Registration Deadline (Online): November 2, 2017

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