Keynote / Invited Speakers

DPS 2017 » Keynote / Invited Speakers

Keynote speaker and title (tentative)

  • Dr. Dan Mocuta (imec)
    "Is there still plenty of room at the bottom? A perspective on technology scaling"

Invited speakers and titles (tentative)

A1. Surface reactions for atomic layer controlled processes (ALE/ALD)

  • Dr. Simon Elliott (University College Cork)
    "Insights into self-limiting surface reactions from atomic-scale simulations"
  • Dr. Dennis Hausmann (Lam Research Corp.)
    "Atomic Layer Deposition of Silicon Dielectrics: Precursors, Processes, and Plasmas"

A2. Etching technologies for latest devices having high-aspect-ratio of 50 or more (HAR)

  • Dr. Sung-Il Cho (Samsung Electronics Co., Ltd.)
    "The Historical Trend of HARC Etch Technology and New Challenges"
  • Prof. Mark J. Kushner (University of Michigan)
    "High and Moderate Aspect Ratio Etching: Insights from Modeling"
  • Dr. Aaron Wilson (Micron Technology, Inc.)
    "Dry Etch Scaling Challenges for High Aspect Ratio 3D NAND and DRAM Memory Technologies"