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Scope

The 38th International Symposium on Dry Process (DPS2016) will be held at Conference Hall, Hokkaido University, Sapporo, Hokkaido, in Japan, on November 21 & 22, 2016.
The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.


Important dates

   Abstract Submission Deadline: July 15 July 29, 2016
   Early Registration Deadline: October 14, 2016
   Late Registration Deadline (Online): November 7, 2016

Recent Updates

News for the Special Issues of Japanese Journal of Applied Physics (JJAP).