Our deepest appreciation to all the participants

The 35th International Symposium on Dry Process (DPS2013) was successfully completed. It was our great pleasure to have 73 contibuted papers (63 Japan, 7 Korea, 2 Taiwan, and 1 Belgium), 145 participants from 5 countries (91 Japan, 32 Korea, 12 Taiwan, 7 USA, and 2 Belgium). We sincerely appreciate lecturers, session chairs, participants, Korean organizing supports from AEPSE committee, BizOcean, Sungkyunkwan University, and all the contributors in the symposium. The next symposium will be held in Yokohama, Japan on the end of November, 2014.

Invitation to submit manuscripts to JJAP: deadline Sept. 8, 2013.

The authors are requested to submit a manuscript directly at: http://jjap.jsap.jp/special/


The 35th International Symposium on Dry Process (DPS2013) will be held at Ramada Plaza Jeju Hotel in Korea on August 29-30, 2013. Dry Processes are the state of the art technologies leading the way through ultra-high performance in microelectronic devices. The DPS has provided a valuable forum of discussion on science and technology of new developments in this field for more than three decades.

Important dates

Abstract Submission Deadline: May 13, April 26, 2013, 24:00 (JST, GMT+9:00)
Early Registration Deadline: June 30, 2013, 24:00 (JST, GMT+9:00)
Late Registration Deadline: July 30, 2013, 24:00 (JST, GMT+9:00)

Frequently asked question

  • The registered person either DPS or AEPSE will able to attend all (DPS and AEPSE) sessions on Thursday and Friday. NOTE: the presentation needs to register for each author.  
  • After the ID application, please visit this-link, then enter ID (your e-mail adress) and password (given by the system). 

Recent Updates

News for Japanese members


[1] AEC/APC Symposium Asia 2013 2013年11月7日(木) 会場:学術総合センター(東京都千代田区) ホームページ http://www.semiconportal.com/AECAPC/

[2] 第26回プラズマ材料科学シンポジウム(SPSM26) 2013年9月23日(月・祝)・24日(火)会場:九州大学医学部 百年講堂 ホームページ http://plasma.ed.kyushu-u.ac.jp/~spsm26/index.html 締め切りが8月5日まで延長されました