DPS2024 45th International Symposium on Dry Process



Definitions of Awards

DPS offers the following awards annually to recognize those who demonstrate outstanding achievements in the fields of interest to DPS.

DPS Nishizawa Award:

The DPS Nishizawa Award is the highest award in DPS. This award recognizes an individual who has made outstanding academic/technological achievements in fields of interest to DPS.

DPS Achievement Award:

The DPS Achievement Award recognizes an individual and/or group that has made outstanding academic/technological achievements, cultivated human resources, and made outstanding contributions through continued DPS activities.

Best Presentation Award: (previously known as the "Best Paper Award" of DPS)

This award is to be offered annually to the authors of the paper that has been presented most excellently in the latest DPS and made significant academic/technological contributions to the fields of interest to DPS.

Young Researcher Award:

This award is to be offered annually to a young researcher who has made an outstanding presentation in the latest DPS. The awardee must be 35 years old or younger as of the 1st of January of the year in which his/her DPS presentation considered for the award is made.

DPS Paper Award:

This award is to be offered to the authors of the best paper published in the Special Issues of Japanese Journal of Applied Physics (JJAP) for DPS in the past 3 years (i.e., DPS 2021, 2022, and 2023) . The awardee(s) of the Best Presentation Award or Young Researcher Award is/are also eligible for this award.

Past Award Winners

Recipient of Nishizawa Award

yearAward RecipientsCitation
DPS2024 Steven M. George Outstanding contributions to the understanding of surface chemistry at the atomic level and the development of new applications for atomic layer processes.
Tetsuya Tatsumi Outstanding achievements regarding mechanism elucidation of dry etching process using fluorocarbon plasma based on quantitative measurements of plasma internal parameters.
DPS2023 Jean-Paul Booth Outstanding achievements in optical diagnostics in reactive plasma processes to elucidate physical and chemical reactions, and in the development of charged particle diagnostic techniques and devices.
Nobuo Fujiwara Outstanding contributions to understanding and development of ECR plasma and its pulsed plasma for dry etching technology.
DPS2022 Geun Young Yeom Development of plasma-assisted processes and their novel systems applied to nanoscale semiconductors and flat panel displays
DPS2021 Masaru Hori Pioneering study of laser diagnostics of reactive plasmas and development of an autonomous control plasma system for precisely controlled fabrications of nano-devices and functional materials.
Olivier Joubert Significant contributions to basic and applied research on plasma etching processes, including collaboration with microelectronics industry.
DPS2019 Vincent M. Donnelly Outstanding fundamental and applied studies for semiconductor plasma processes and diagnostics.
Kazuo Nojiri Pioneering work on RF pulsing technology and charging up study in dry etching for semiconductors.
Gottlieb S. Oehrlein Contributions to understanding/control of plasma surface interactions and advancement of dry etching technology.
DPS2018 Nobuo Hayasaka Pioneering study of radical based semiconductor device processes.
Moritaka Nakamura Research and development of advanced semiconductor process technology.
Kouichi Ono Study on plasma-surface interactions during plasma etching of advanced devices.
Kazzunori Tsujimoto Development of innovative dry etching technologies, high gas flow, gas chopping, and cryogenic etching for semiconductors.
DPS2017 David Barry Graves Pioneering study on modeling and simulation of process plasma based on plasma surface reactions.
Toshiaki Makabe Development of modeling of low-temperature, non-equilibrium plasma and surface processes.
Masahiro Yoneda Outstanding contributions to the development in the field of dry process and the management of the symposium.
DPS2016 Hideo Sugai Pioneering work on gas phase/surface processes in reactive plasma and development of novel plasma source.
DPS2015 Kiyoshi Asakawa Pioneering work on the dry etching process and the process-induced damage of compound semiconductors.
DPS2014 Yasuo Tarui Devoted contributions to the sustainable growth and management of the symposium.
DPS2013 Haruo Okano Research and development of advanced plasma etching processes and equipment.
DPS2012 Herbert Harold Sawin Study on gas-surface interaction modeling, kinetics, and monitoring technology in various plasma processing.
Richard A. Gottscho Outstanding leadership and insight into multiple generations of innovation in semiconductor manufacturing process and equipment.
DPS2011 Naokichi Hosokawa and Tsutomu Tsukada Discovery of accelerated etching phenomenon by reactive gas plasma and the development of reactive ion etching technology.
Shinichi Tachi Pioneering work on cryogenic dry etching and development of innovative dry etching technologies for semiconductors.
DPS2010 Jack W Coburn Groundbreaking studies on plasma and ion-beam materials processing, which led the progress in nanoscience and nanotechnology.
Harold F. Winters Pioneering work on rigorous surface science approaches to bear on a variety of phenomena related to plasma–surface interactions.
DPS2009 Haruhiko Abe Seminal pioneering work in the field of dry processes, which has profoundly contributed on the development of semiconductor devices.
Keizo Suzuki Pioneering work on microwave ECR plasma etching technology for directional patterning in integrated device fabrication.
DPS2008 Masataka Hirose Pioneering work on semiconductor materials/processes, development of integrated device technology and major contribution to DPS evolution.
Yasuhiro Horiike Study on advanced fabrication technologies for new functional devices and major contributions to the development of dry process symposium since its early days.

Recipient of Achievement Award

yearAward RecipientsCitation
DPS2024 Keiji Nakamura Establishment of plasma electron density measurement technology applicable to reactive plasma using electromagnetic wave absorption, and significant contribution as the first author to the International Symposium on Dry Process.
Tokuhisa Ohiwa Significant achievements in the development of etching processes, such as Self Align Contact, HARC, and Low-k etching, implemented in LSI manufacturing.
DPS2023 Yoshimichi Ohki Outstanding expert on the physical properties and applications of dielectric materials, and significant contributions to the development of the dry process symposium.
DPS2022 Toshio Hayashi Development of a plasma source of magnetic neutral loop discharge and database construction for gas dissociation process by quantum chemical calculations.

Best Presentation Award Winners

DPS2023 Best Presentation Award:

  • R. Suda, M. Yokoi, S. Ohuchida, T. Katahira, M. Tomura, Y. Kihara, M. Honda (Tokyo Electron Miyagi Ltd.)

DPS2022 Best Presentation Award:

  • N. Kuboi, H. Matsugai, T. Tatsumi, S. Kobayashi, Y. Hagimoto, H. Iwamoto (Sony Semiconductor Solutions Corp.)

DPS2021 Best Presentation Award:

  • S. Kumakura, H. Sasagawa, T. Nishizuka,Y. Kihara, M. Honda (Tokyo Electron Miyagi Ltd.)

DPS2019 Best Presentation Award:

  • T. Niizeki, M. Tomura, Y. Kihara, M. Honda (Tokyo Electron Miyagi Ltd.)

DPS2018 Best Presentation Award:

  • M. Omura, J. Hashimoto, T. Adachi, Y. Kondo, M. Ishikawa, J. Abe, T. Matsushita, H. Hayashi (Toshiba Memory Corp.)

DPS2017 Best Presentation Award:

  • M. Matsui (Hitachi Ltd.)
    K. Kuwahara (Hitachi High-Technologies Corp.)

DPS2016 Best Presentation Award:

  • T. Seki, T. Aoki, J. Matsuo (Kyoto University),
    H. Yamamoto, T. Kozawa (Osaka University),
    T. Shojo, K. Koike (Iwatani Corp.)

DPS2015 Best Presentation Award:

  • O.Pollet, N. Posseme,
    V. Ah-Leung(CEA-Leti),
    M. Garcia Barros(ST Microelectronics)

Best Paper Award Winners

DPS2014 Best Paper Award:

  • not applicable

DPS2013 Best Paper Award:

  • not applicable

DPS2012 Best Paper Award:

  • not applicable

DPS2011 Best Paper Award:

  • K. Kinoshita (Tohoku University)

DPS2010 Best Paper Award:

  • not applicable

DPS2009 Best Paper Award:

  • Koji Eriguchi (Kyoto University)

DPS2008 Best Paper Award:

  • M. Fukasawa (Sony Corp.)

DPS2007 Best Paper Award:

  • G. Delgadino (Lam Research Corp.)

DPS2006 Best Paper Award:

  • M. Kurihara (Hitachi, Ltd.)

DPS2005 Best Paper Award:

  • not applicable

DPS2004 Best Paper Award:

  • not applicable

DPS2003 Best Paper Award:

  • not applicable

DPS2002 Best Paper Award:

  • Yoshinori Momonoi (Hitachi Ltd.)
  • Takanori Ichiki (University of Tokyo)

DPS2001 Best Paper Award:

  • Junko Abe (Toshiba Corp.)

DPS2000 Best Paper Award:

  • N. Negishi (Hitachi, Ltd.)

Young Researcher Award Winners

DPS2023 Young Researcher Award:

  • T. Goya (Kyoto Univ.)
  • S. Kawamura (Nagoya Univ.)

DPS2022 Young Researcher Award:

  • T. Hamano (Kyoto Univ.)
  • K. Ichikawa (Nagoya Univ.)

DPS2021 Young Researcher Award:

  • T. Hasegawa (Air Liquide Laboratories K. K.)
  • A. Osonio (Nagoya Univ.)

DPS2019 Young Researcher Award:

  • T. Hamano (Kyoto Univ.)
  • T. Kuyama (Kyoto Univ.)

DPS2018 Young Researcher Award:

  • T. Iwase (Hitachi Ltd.)
  • S. Kumakura (Tokyo Electron Miyagi Ltd.)
  • Y. Mizukawa (Hiroshima Univ.)
  • K. Nakane (Nagoya Univ.)

DPS2017 Young Researcher Award:

  • A. Hirata (Sony Semiconductor Solutions Corp.)
  • Y. Yoshikawa (Kyoto University)

DPS2016 Young Researcher Award:

  • Y. Ishii (Hitachi High Technologies America, Inc.)
  • N. Miyoshi (Hitachi, Ltd.)
  • T. Ueyama (Nagoya University)

DPS2015 Young Researcher Award:

  • T. Iwase(Hitachi Ltd.)
  • N. Nakazaki(Kyoto University)

DPS2014 Young Researcher Award:

  • H. Li(Osaka University)
  • Z. Liu(Nagoya University)
  • T. Shigetoshi(Sony Corp.)

DPS2013 Young Researcher Award:

  • Y.Ding (Tokyo Inst. of Tech)
  • H.Yamamoto (Toshiba Corp.)

DPS2012 Young Researcher Award:

  • S.Hayashi (Hiroshima University)
  • A.Pandey (Chubu University)

DPS2011 Young Researcher Award:

  • Hirotaka Tsuda (Kyoto University)
  • Naoya Sumi (Nagoya University)

DPS2010 Young Researcher Award:

  • Tomoko Ito (Osaka University)
  • Asahiko Matsuda (Kyoto University)
  • Hideharu Shimizu (Taiyo-Nippon Sanso Co.)

PS2009 Young Researcher Award:

  • Hiroshi Yamamoto (Nagoya University)
  • A. Kawanami (Hiroshima University)

DPS2008 Young Researcher Award:

  • M. J. Titus (University of Calfornia, Berkeley)
  • H. Furukawa (Hiroshima University)

DPS2007 Young Researcher Award:

  • T. Ohchi (Sony Corp.)
  • T. Yorimoto (Hiroshima University)

DPS2006 Young Researcher Award:

  • E. Kesters (IMEC)

DPS2005 Young Researcher Award:

  • Yasuhiro Morikawa (ULVAC. Inc.)
  • W. S. Hwang (National University of Singapore)

DPS2004 Young Researcher Award:

  • Kazuo Takahashi (Kyoto University)

DPS2003 Young Researcher Award:

  • Nobuyuki Negishi (Hitachi, Ltd.)
  • Koji Yamakawa (Nagoya University)

DPS2002 Young Researcher Award:

  • Kazutake Taniguchi (University of Tokyo)

DPS2001 Young Researcher Award:

  • Takeshi Kuriyagawa (University of Tokyo)
  • Kazuo Takahashi (Kyoto University)

DPS2000 Young Researcher Award:

  • Hyun-Ho Doh (University of Tokyo)
  • Hisao Nagai (Nagoya University)

DPS Paper Award Winners

DPS paper award that is given to excellent papers in the recent special issues of "Dry Process" and the articles are set "Open Access" for ever, or "Free Access" until December 2025.

DPS2023 DPS Paper Award:

DPS2022 DPS Paper Award:

DPS2021 DPS Paper Award:

DPS2019 DPS Paper Award:

DPS2018 DPS Paper Award:

DPS2017 DPS Paper Award:

DPS2016 DPS Paper Award:

DPS2015 DPS Paper Award: