Keynote / Invited Speakers
Nishizawa Award Lectures
- Steven M. George (University of Colorado Boulder)
- Tetsuya Tatsumi (Sony Semiconductor Solutions Corporation)
Keynote speaker
- Atsuyoshi Koike (Rapidus Corporation)
"Rapidus’s Challenge Towards Mass Production of 2nm Logic Semiconductors - Aiming for a Greener Manufacturing Process -"
Invited speakers and tentative titles
AS1. Understanding the mechanisms for future high-aspect-ratio etching technology
- Julian Schulze (Ruhr University Bochum)
"Knowledge based plasma control concepts for etching" - Kukhan Yoon (Samsung Electronics Co., Ltd.)
AS2. Atomic layer processes (ALE/ALD/ASD) for ultimate control of surface reaction
- Christophe Vallee (University at Albany)
"Engineering plasma for atomic scale processing: ALD, ALE and ASD"
AS3. Breakthrough process technology for advanced logic device fabrication
- Ilgyo Koo (imec)
"The next generation of Complementary FET (CFET) etch challenges and progress"