Scope
The 47th International Symposium on Dry Process (DPS2026) will be held at Tokyo International Exchange Center, Plaza Heisei, Tokyo, Japan from November 19 to 20, 2026. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than four decades.
Notice for Dry Process School
The 2nd Dry Process School will be held at AIST Tokyo Waterfront (Annex) & Plaza Heisei, Tokyo International Exchange Center, from the afternoon of November 16 to the morning of November 18, 2026.
Important dates
| Abstract Submission Deadline: | July 21, 2026 |
Recent Updates
- Feb. 6, 2026
- DPS2026 website open.
News for the Special Issues of Japanese Journal of Applied Physics (JJAP).
IF for the special issue of DPS in JJAP
1.67 (2017)
- Refer to the following page for the publication charge.
https://iopscience.iop.org/journal/1347-4065/page/Publication_Charges - JJAP Special Issues is published in the web site;
DPS2024 (Jpn. J. Appl. Phys. 64 July 2025) (Free until July 2026)
https://iopscience.iop.org/collections/jjap-250328-01
DPS2023 (Jpn. J. Appl. Phys. 63 July 2024.) (Free until July 2025)
https://iopscience.iop.org/collections/jjap-240402-02
DPS2022 (Jpn. J. Appl. Phys. 62 July 2023.)
https://iopscience.iop.org/issue/1347-4065/62/SI
DPS2021 (Jpn. J. Appl. Phys. 61 July 2022.)
https://iopscience.iop.org/issue/1347-4065/61/SI
DPS2019 (Jpn. J. Appl. Phys. 59 June 2020.)
https://iopscience.iop.org/issue/1347-4065/59/SJ
DPS2018 (Jpn. J. Appl. Phys. 58 June 2019.)
https://iopscience.iop.org/issue/1347-4065/58/SE
OPEN ACCESS & FREE ACCESS