Invited Speakers
Invited speakers and titles (tentative)
AS1. Challenges and breakthroughs in high-aspect-ratio processes: etching and deposition
- Hyunwoo Lee (Samsung Electronics Co., Ltd.)
"Sub-10nm DRAM HARC Etching: Challenges and Mitigation Strategies"
AS2. Modeling, simulation, and digital twins for future dry process development
- Shahid Rauf (Applied Materials Inc.)
"Plasma Modeling, Diagnostics, and Machine Learning: A Semiconductor Industry Perspective"
AS3. Ultimate control of surface reactions at the atomic scale
- Remi Dussart (Université d'Orléans)
"Cryogenic plasma processes: mechanisms and advantages"