DPS2026 47th International Symposium on Dry Process
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Theme/Topics/Arranged session
Theme
- Dry processes and related technologies from fundamentals to applications
Topics
- Etching Technologies
- Manufacturing Technologies (AEC, APC, EES, FDC)
- Surface Reaction and Damage
- Plasma Diagnostics and Monitoring Systems
- Computational Approaches (Modeling, Simulation, Machine Learning, AI, Informatics, DX) for Dry Process
- Plasma Generation (Equipment/Source)
- Deposition Technologies (CVD / PVD)
- Atomic Layer Processes (ALD/ALE)
- Dry process for Green Transformation: GX (Energy saving technology, Alternative gas, Sustainability)
- Plasma Processes for New Material Devices (MRAM, Power, Organic, III-V, 2D)
- Plasma Processes for Biological and Medical application, MEMS
- Atmospheric Pressure Plasma and Liquid Plasma
- New Dry Process Concepts
- Dry Processes for 3D-IC / Packaging
Arranged session
- Challenges and breakthroughs in high-aspect-ratio processes: etching and deposition
- Modeling, simulation, and digital twins for future dry process development
- Ultimate control of surface reactions at the atomic scale