DPS2026 47th International Symposium on Dry Process

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Theme/Topics/Arranged session

Theme

  • Dry processes and related technologies from fundamentals to applications

Topics

  1. Etching Technologies
  2. Manufacturing Technologies (AEC, APC, EES, FDC)
  3. Surface Reaction and Damage
  4. Plasma Diagnostics and Monitoring Systems
  5. Computational Approaches (Modeling, Simulation, Machine Learning, AI, Informatics, DX) for Dry Process
  6. Plasma Generation (Equipment/Source)
  7. Deposition Technologies (CVD / PVD)
  8. Atomic Layer Processes (ALD/ALE)
  9. Dry process for Green Transformation: GX (Energy saving technology, Alternative gas, Sustainability)
  10. Plasma Processes for New Material Devices (MRAM, Power, Organic, III-V, 2D)
  11. Plasma Processes for Biological and Medical application, MEMS
  12. Atmospheric Pressure Plasma and Liquid Plasma
  13. New Dry Process Concepts
  14. Dry Processes for 3D-IC / Packaging

Arranged session

  1. Challenges and breakthroughs in high-aspect-ratio processes: etching and deposition
  2. Modeling, simulation, and digital twins for future dry process development
  3. Ultimate control of surface reactions at the atomic scale