DPS 2020 42nd International Symposium on Dry Process


Invited Speakers

Nishizawa Award Lecture and tentative titles

  • Masaru Hori (Nagoya University)
  • Olivier Joubert (LTM/CNRS)

Invited speakers and tentative titles

A1. Applications and Researches of Atomic Layer Controlled Etching and Deposition(ALE/ALD/Area Selective-ALD
  • Sumit Agarwal (Colorado School of Mines)
A2. Challenges to Limits for High Aspect Ratio Etching
  • Yeon Ho Im (Chonbuk National University)
  • Thorsten Lill (Lam Research Corp.)
A3. Rethinking of Cryogenic Etching
  • Rémi Dussart (GREMI - Université d'Orléans)
    "Plasma cryogenic etching : benefits of cooling the substrate at a low temperature in etching process technologies"
Plasma Etching New Material
  • Luxherta Buzi (IBM Corp. )
    "Investigation of Plasma Etch Damage of Ge2Sb2Te5 for Storage Class Memory and AI"
  • Erwine Pargon (University Grenoble Alpes, CNRS, LTM)
    "Cycling process in remote plasma source for selective etching with nanometric control"