DPS 2020 42nd International Symposium on Dry Process


Theme/Topics/Arranged session


  • Dry processes and related technologies from fundamentals to applications


  1. Etching Technologies
  2. Manufacturing Technologies (AEC, APC, EES, FDC)
  3. Surface Reaction and Damage
  4. Plasma Diagnostics and Monitoring Systems
  5. Computational Approaches(Modeling, Simulation and Machine Learning) for Dry Process
  6. Plasma Generation (Equipment/Source)
  7. Deposition Technologies (CVD / PVD)
  8. Atomic Layer Processes (ALD/ALE)
  9. Plasma Processes for 3D Device, FPD, Photovoltaic Devices
  10. Plasma Processes for New Material Devices (MRAM, Power, Organic)
  11. Plasma Processes for Biological and Medical application, MEMS
  12. Atmospheric Pressure Plasma and Liquid Plasma
  13. New Dry Process Concepts

Arranged session

  1. Applications and Researches of Atomic Layer Controlled Etching and Deposition(ALE/ALD/Area Selective-ALD)
  2. Challenges to Limits for High Aspect Ratio Etching
  3. Rethinking of Cryogenic Etching