Presentation guideline
Poster session is divided into two halves in order to prevent congestion.
At least one of the authors must stay in front of the poster during the assigned Core-Time:
Core-time (Part 1) 18:20–19:40 Thursday, November 18, 2021　‡　Even number
Core-time (Part 2) 11:30 -12:50 Friday, November 19, 2021　†　Odd number

Etching Technology

• †P-1 Y. Sonoda

  Isotropic radical etching of HfO2 with ECR etching system

• ‡P-2 A. Hashimoto

  Batch type chemical dry etching system using HF gas

• †P-3 M. Kyuzo

  Influence of small grounded surface on plasma property in an inductively-coupled plasma with floating liner

Surface Reaction and Damage

• ‡P-4 R. Kurebayashi

  Hydrogenation and Reduction of Magnesium Oxide by Ion Dose and Temperature Control in Microwave Excited Hydrogen Plasma

• †P-5 Y. Saito

  Self-align fabrication of nano-reservoirs with NV centers in diamond for high-resolution nano-NMR

• ‡P-6 S. Toko

  Energy utilization efficiency in CO₂ methanation with plasma catalysis

• †P-7 S. Yamamoto

  Plasma irradiation behavior of Y-Al-O ceramics

• ‡P-8 S. Asada

  Sulfur Defect Formation in Monolayer MoS2 Maintaining Crystallinity by MW Plasma Treatment

Plasma Diagnostics and Monitoring Systems

• †P-9 Y. Yamashita

  The plasma diagnosis of 133 Pa argon microwave discharge plasma by optical emission spectroscopic measurement based on systematic excitation-kinetics analysis

• ‡P-10 H. Akatsuka

  Effect of Metastable Quenching by Oxygen Admixture on Excited-State Populations of Low-Pressure Ar Plasma

• †P-11 K. Lin

  Diagnostics of Electron Density and Temperature of Atmospheric Pressure Helium Plasma Based on Collisional-Radiative Model

• ‡P-12 Y. Kuzuki

  Effect of electron energy distribution function on spectroscopic measurement of excited-state densities of non-equilibrium argon plasma

• †P-13 T. Ninomiya

  First result of three-dimensional reconstruction of large non-uniform surface wave plasma through multi lens array attached to single viewing port

• ‡P-14 S. H. Son

  Development of Non-invasive Plasma Density Uniformity Monitoring Method in Capacitively Coupled Plasma

• †P-15 S. Kito

  Behaviors of metastable-state argon ion density in an electron cyclotron resonance plasma source measured by laser-induced fluorescence spectroscopy

• ‡P-16 D. Ogawa

  Investigation of Coupled Curling Probe for In-situ Measurement of Electron Density and Deposited Film Thickness

Computational Approaches (Modeling, Simulation and Machine Learning) for Dry Process

• †P-17 T. Kanki

  Simulations of novel compact separator for extracting specific reactive ions from large plasma source

• †P-19 S. Lee

  Forming TiO₂ By-Product in Plasma Abatement System for the Extension of Preventive Maintenance Period

Plasma Generation (Equipment/Source)

• ‡P-20 W. Okauchi

  Dependences of magnetic filter attached to RF source on producing negative ions for exploring novel nanoscale processing

• †P-21 C. Katsuki

  First result of extracting not only negative but also positive ion beams from RF source for investigating O– and H– applied to novel nano scale processing

• ‡P-22 R. Masai

  Characterization of a high-repetition nanosecond pulsed nitrogen glow discharge plasma using time-resolved optical emission spectroscopy

• †P-23 Y. Asamoto

  Characterization of carrier conduction in a magnetically-confined vacuum arc discharge and its application to control of incident-ion flux to a substrate

Deposition Technologies (CVD / PVD)

• ‡P-24 Y. Ohtsu

  Spatial profile of Al-ZnO thin film on polycarbonate deposited by ring-shaped magnetized rf plasma sputtering with two facing cylindrical Al₂O₃-ZnO targets

• †P-25 H. Kawasaki

  Multi-elements mixture thin film preparation process by sputtering deposition using mixture powder target

• ‡P-26 H. Maeda

  Properties of CrN/VN multilayer films prepared via a hybrid system of HiPIMS and pulsed-DC magnetron sputtering

• †P-27 T. Harigai

  High-Rate DLC Deposition by Using Ar/C2H2 Plasma Jet in Combination with Substrate-Stage Discharge

• ‡P-28 T. Mine

  Properties of diamond-like carbon films prepared with a high-repetition nanosecond pulsed hydrogen/methane glow discharge plasma

• †P-29 Y. Daigo

  Reduction of stacking fault density in 4H-SiC epi-layers on 150 mm diameter wafers

• ‡P-30 M. Shiratani

  Study of effect of amplitude modulated discharge on growth of nanoparticles in TEOS plasma

• †P-31 T. Watanabe

  High uniform and stable performance of epi-growth for low doped 4H-SiC thick epi-layers on 150mm diameter wafers

• ‡P-32 S. H. Hwang

  Reduction of compressive stress of hydrogenated amorphous carbon films by inserting carbon nanoparticle layer using plasma CVD

• †P-33 K. Takenaka

  Effect of process conditions on characteristics of InGaZnO thin-film transistors fabricated with plasma-assisted reactive process

• ‡P-34 T. Ohta

  Plasma diagnostics on TiN-HiPIMS

• †P-35 H. Bae

  High Speed sp²-rich Carbon Film Deposition with Surface-wave Microwave Plasma

Atomic Layer Processes (ALD/ALE)

• ‡P-36 J. U. Tercero

  Molecular dynamics simulation of post-etch damage formation in silicon nitride atomic layer etching

Plasma Processes for 3D Device, FPD, Photovoltaic Device

• †P-37 T. Takasaki

  Through-Via Etching Technology for Oxide-Metal-Organic-Silicon Heterogeneous Layers in DRAM 3DI Applications

Plasma Processes for New Material Devices (MRAM, Power, Organic)

• ‡P-38 J. Wu

  High Density Formation of Fe-based Silicide Nanodots Induced by Remote H₂ Plasma

Plasma Processes for Biological and Medical application, MEMS

• †P-39 K. Nakajima

  Effect to cell number and cytotoxic activity of active oxygen species irradiation on NK cell

• ‡P-40 K. Nishida

  Inactivation Effect of Atmospheric Pressure He/O₂ Plasma Irradiation on Oral Cancer Cells HSC3

• †P-41 H. Uematsu

  Activation of cytokine release from EL4 T-cell by irradiation with atmospheric oxygen plasma

• ‡P-42 K. Nagata

  Dependence on phagocytosis of macrophages and reactive oxygen species by atmospheric pressure oxygen plasma

• †P-43 R. Muto

  Sterilization characteristics inside narrow tube by using atmospheric pressure dielectric barrier discharge

Atmospheric Pressure Plasma and Liquid Plasma

• ‡P-44 S. Khanom

  Discharge of Oxygen Plasma for Removal of Metal Ions from Water

• †P-45 R. Kawakami

  Photobactericidal Activity of Anatase Titanium Dioxide Nanoparticles Annealed with the Assistance of Nonequilibrium Atmospheric-Pressure Oxygen Plasma

• ‡P-46 T. Izumi

  Bactericidal Effects of Nonequilibrium Atmospheric-Pressure Plasma Jet on Hydroponic Nutrient Solutions

• †P-47 Y. Mimoto

  Nonequilibrium Atmospheric-Pressure O2 Plasma-Assisted Annealing Effect on Photocatalytic Activity of Anatase/Rutile-Mixed Phase TiO₂ Nanoparticles

• ‡P-48 T. Fukui

  Effect of surrounding gas on aggregation of albumin using low-temperature atmospheric pressure plasma jet

• †P-49 J. Nonaka

  Improvement of adhesion using low-temperature helium plasma jet at atmospheric pressure

• ‡P-50 H. Suzuki

  Investigation of Ar/O₂ atmospheric-pressure microwave line plasma and its application to Polyimide film ashing

New Dry Process Concepts

• †P-51 T. Seki

  High aspect (> 20) etching with reactive gas cluster injection

• ‡P-52 A. Khan

  Process control of electrohydrodynamic nanofiber deposition on PDMS substrates