DPS 2018 40th International Symposium on Dry Process



The 40th International Symposium on Dry Process (DPS2018) will be held at Toyoda Auditorium (Toyoda Kodo), Higashiyama Campus, Nagoya University, Nagoya, Aichi in Japan from November 13 to 15, 2018. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

abstract submission    registration

Important dates

Abstract Submission Deadline: July 13 July 27, 2018
Early Registration Deadline: October 5, 2018
Late Registration Deadline (Online): October 31, 2018

Recent Updates

Jul. 6, 2018
Submission deadline extended to July 27, 2018.
Jun. 18, 2018
On-Line registration opened.
Jun. 12, 2018
Updeted (News for the Special Issues of Japanese Journal of Applied Physics (JJAP)).
Jun. 12, 2018
DPS2017 Special Issue of JJAP is published.
May. 29, 2018
Timetable(Tentative) is available.
May. 10, 2018
On-Line Submission system is opened.
Feb .28, 2018
DPS2018 website open.

News for the Special Issues of Japanese Journal of Applied Physics (JJAP).

IF for the special issue of DPS in JJAP

1.67 (2017)

DPS Paper Award Winners

DPS paper award that is given to excellent papers in the recent special issues of “Dry Process”, and the article is set “Open Access” for ever.

DPS2017 DPS Paper Award:

DPS2016 DPS Paper Award:

DPS2015 DPS Paper Award: