DPS 2018 40th International Symposium on Dry Process


40th Anniversary Program on November 13

The past, present, and future on dry process

International Symposium on Dry Process (DPS2018) will be held at Nagoya University, Nagoya in Japan, on November 13 to 15, 2018. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field.

Plenary talks on Nov. 13 Tuesday AFTERNOON

koike-san Atsuyoshi Koike (SanDisk and Western Digital Technologies, Inc., Japan)
Tentative Title "Advanced Semiconductor Manufacturing – Intelligent Fab Systems and Smart Equipment"
sanden Richard van de Sanden (Dutch Institute for Fundamental Energy Research(DIFFER) / The Eindhoven University of Technology (TU/e), the Netherland)
Tentative Title "Renewable energy driven non-equilibrium chemistry: plasma chemistry as the special case"
wakabayashi Hitoshi Wakabayashi (Tokyo Institute of Technology, Japan)
Tentative Title "Benchmark on Advanced Logic Devices and Predictive Discussion on Future LSIs"
harada Kanako Harada (JST/The University of Tokyo, Japan)
Tentative Title "Bionic Humanoids: current research and future vision"
morikawa Takayuki Morikawa (Nagoya University, Japan)
Tentative Title "Mobility Services with Autonomous Cars in Nagoya University COI Project"

Panel discussion
Challenges in industrial revolution (e.g. IoT, Energy, big data, artificial intelligence (AI), Mobility, Medicine, Robot, and the sharing economy) into social life.

Looking ahead
The prosperity of all societies - now and in the forseeable future - depend on our human's evolving capacity to learn, inspire, create and innovate. – F. D. Ackerman