DPS 2018 40th International Symposium on Dry Process



The 40th International Symposium on Dry Process (DPS2018) will be held at Toyoda Auditorium (Toyoda Kodo), Higashiyama Campus, Nagoya University, Nagoya, Aichi in Japan from November 13 to 15, 2018. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

on-site registration

Important dates

Abstract Submission Deadline: July 13 July 27, 2018
Early Registration Deadline: October 5, 2018
Late Registration Deadline (Online): October 31, 2018

Recent Updates

Nov. 13, 2018
Submission deadline to JJAP extended to November 20 21, 2018.
Oct. 31, 2018
On-line registration is closed. On-site registration is available for those who would like to attend the DPS2018.
Oct. 26, 2018
Poster Program opened.
Oct. 24, 2018
Timetable updated.
Oct. 19, 2018
Presentation Guidelines is opened.
Oct. 4, 2018
Timetable(Tentative) updated.
Oct. 3, 2018
JJAP special issue On-Line Submission is opened.
Jul. 6, 2018
Submission deadline extended to July 27, 2018.
Jun. 18, 2018
On-Line registration opened.
Jun. 12, 2018
Updeted (News for the Special Issues of Japanese Journal of Applied Physics (JJAP)).
Jun. 12, 2018
DPS2017 Special Issue of JJAP is published.
May. 29, 2018
Timetable(Tentative) is available.
May. 10, 2018
On-Line Submission system is opened.
Feb .28, 2018
DPS2018 website open.

News for the Special Issues of Japanese Journal of Applied Physics (JJAP).

IF for the special issue of DPS in JJAP

1.67 (2017)


Regular Paper

DPS paper award that is given to excellent papers in the recent special issues of “Dry Process”, and the article is set “Open Access” for ever.

DPS2017 DPS Paper Award: "Highly selective etching of LaAlSiOx to Si using C4F8/Ar/H2 plasma",
Sasaki, Toshiyuki; Matsuda, Kazuhisa; Omura, Mitsuhiro; Sakai, Itsuko; Hayashi, Hisataka
JJAP, 54(2015), 06GB03

DPS2016 DPS Paper Award: "Plasma process induced physical damages on multilayered magnetic films for magnetic domain wall motion",
Kinoshita, Keizo; Honjo, Hiroaki; Fukami, Shunsuke; et al.
JAPP, 53(2014), 03DF03

DPS2015 DPS Paper Award: "Effects of straggling of incident ions on plasma-induced damage creation in "fin"-type field-effect transistors",
Eriguchi, Koji; Matsuda, Asahiko; Takao, Yoshinori; et al.
JJAP, 53(2014), 03DE02

Progress Reviews

News for Japanese members

応用物理学会プラズマエレクトロニクス分科会の協賛により、「第29回プラズマエレクトロニクス講習会」を 2018 年11 月20 日(火)に東京大学 本郷(浅野)キャンパス 武田先端知ビル 「武田ホール」にて開催致します。
本講習会では、産業応用で必要とされるプロセスプラズマの生成、診断・ 制御の基礎と、その先端応用技術を各分野にて第一線でご活躍の先生方よりご講義いただきます。詳しくはこちらをご参照ください。