DPS 2019 41st International Symposium on Dry Process


Theme/Topics/Arranged session


  • Dry processes and related technologies from fundamentals to applications


  1. Etching Technologies
  2. Manufacturing Technologies (AEC, APC, EES, FDC)
  3. Surface Reaction and Damage
  4. Plasma Diagnostics and Monitoring Systems
  5. Modeling and Simulation
  6. Plasma Generation (Equipment/Source)
  7. Deposition Technologies (CVD / PVD)
  8. Atomic Layer Processes (ALD/ALE)
  9. Plasma Processes for 3D Device, FPD, Photovoltaic Devices
  10. Plasma Processes for New Material Devices (MRAM, Power, Organic)
  11. Plasma Processes for Biological and Medical application, MEMS
  12. Atmospheric Pressure Plasma and Liquid Plasma
  13. New Dry Process Concepts

Arranged session

  1. Novel Atomic Layer Etching and Atomic Layer Deposition approaches for advanced plasma process applications
  2. Advanced hardware and process development for overcoming High Aspect Ratio etching (AR>100)
  3. How AI and Deep Learning are transforming the plasma process?
In conjunction with