DPS2022 43rd International Symposium on Dry Process

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Invited speakers and tentative titles

Invited speakers and tentative titles

AS1. Challenges to limits for high aspect ratio etching
  • Zoltan Donko (Wigner Research Center for Physics)
    "Charged particle dynamics in capacitively coupled radiofrequency discharges driven by complex waveforms"
AS2. Novel control of surface reaction in atomic layer processes (ALE / ALD / Area selective ALD)
  • Alok Ranjan (Tokyo Electron America)
    "Breakthrough technologies for opening process windows for sub-nanoscale precision etch"
AS3. 3D-IC packaging for energy-saving and high-density interconnection
  • Clinton Goh (Applied Materials, Inc.)
    "Plasma Processing for Next Generation Packaging System Scaling"