DPS2023 44th International Symposium on Dry Process

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In conjunction with

AECAPC


icep2023


Scope

The 44th International Symposium on Dry Process (DPS2023) will be held at Winc Aichi, Nagoya, Japan, from November 21 to 22, 2023. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

registration
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Important dates

Abstract Submission Deadline: July 21, 2023
Notification of Abstract Acceptance: September 15, 2023
Early Registration Deadline: October 6, 2023
Late Registration Deadline (Online): October 31, 2023
Publish Proceedings (Abstracts): November 14, 2023

Recent Updates

Sep. 20, 2023
Timetable(Tentative) updated.
Sep. 15, 2023
Notification of abstract acceptance was announced.
Jul. 06, 2023
Information/Guideline for DPS Career Assistant Board is available.
Jun. 27, 2023
Timetable(Tentative) is available.
Jun. 26, 2023
On-Line registration opened.
May. 15 2023
On-Line Submission system is opened.
Feb. 15, 2023
DPS2023 website open.

News for the Special Issues of Japanese Journal of Applied Physics (JJAP).

IF for the special issue of DPS in JJAP

1.67 (2017)

OPEN ACCESS & FREE ACCESS

News for Japanese members

応用物理学会プラズマエレクトロニクス分科会の主催により、「第34回プラズマエレクトロニクス講習会」を 2023 年 11 月 17 日(金) にJEC日本研修センター 心斎橋とオンライン(Zoomウェビナー)のハイブリッド開催を致します。 本講習会では産業応用で必要とされるプロセスの基礎と高周波プラズマの生成制御について、プラズマ分野を代表する先生方からご講義いただきます。詳しくはこちら をご参照ください。