The 44th International Symposium on Dry Process (DPS2023) will be held at Winc Aichi, Nagoya, Japan, from November 21 to 22, 2023. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.
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|Abstract Submission Deadline:||July 21, 2023|
|Early Registration Deadline:|
|Late Registration Deadline (Online):|
- May. 15 2023
- On-Line Submission system is opened.
- Feb. 15, 2023
- DPS2023 website open.
News for the Special Issues of Japanese Journal of Applied Physics (JJAP).
IF for the special issue of DPS in JJAP
- The publication charge is 40000JPY/article.
- JJAP Special Issues is published in the web site;
DPS2021 (Jpn. J. Appl. Phys. 61 July 2022.) (Free until July 2023)
DPS2019 (Jpn. J. Appl. Phys. 59 June 2020.)
DPS2018 (Jpn. J. Appl. Phys. 58 June 2019.)
OPEN ACCESS & FREE ACCESS