Keynote / Invited Speakers
Invited speakers and tentative titles
AS1. Challenges to overcome the limits for high aspect ratio etching
- Mark J. Kushner (University of Michigan)
AS3. How AI and Machine Learning are transforming dry process technologies
- Richard A. Gottscho (Lam Research Corp.)
"Attacking the Little Data R&D Problem"
- Dr. Jun Haeng Lee (Samsung Electronics Co., Ltd.)
”Acceleration of Semiconductor Process Optimization through AI : Opportunities and Challenges"