DPS2023 44th International Symposium on Dry Process


Keynote / Invited Speakers

Invited speakers and tentative titles

AS1. Challenges to overcome the limits for high aspect ratio etching
  • Mark J. Kushner (University of Michigan)
AS3. How AI and Machine Learning are transforming dry process technologies
  • Richard A. Gottscho (Lam Research Corp.)
    "Attacking the Little Data R&D Problem"
  • Dr. Jun Haeng Lee (Samsung Electronics Co., Ltd.)
    ”Acceleration of Semiconductor Process Optimization through AI : Opportunities and Challenges"